发明名称 Correcting device to compensate for polarization distribution perturbations and projection objective for microlithography
摘要 Disclosed is a corrective device for compensating disturbances of polarization distribution across the cross-section of a light beam ( 10 ). Said corrective device comprises a corrective member ( 18; 118 ) encompassing two double-refractive corrective elements ( 20, 22; 120 a , 120 b , 122; 220; 222; 320, 322 ) with two substantially parallel surfaces ( 24, 26; 126, 127 ). The thickness (d) of the corrective element ( 22, 122, 222 ) is essentially constant between said surfaces ( 26; 126, 127 ). At least one of the surfaces ( 24, 26, 126, 127 ) of at least one of the corrective elements ( 20, 22, 120 a , 120 b , 122, 220, 222, 320, 322 ) is refinished in such a way that local irregularities in thickness Deltad are created by means of which the disturbances of polarization distribution are at least nearly compensated. The arrangement, thickness (d), and double-refractory properties of the corrective elements ( 20, 22; 120 a , 120 b , 122; 220; 222; 320, 322 ) are selected such that the double-refractive effects thereof mutually cancel each other if the local irregularities in thickness Deltad are not taken into consideration. The inventive corrective device influences polarization only at points where disturbances are to be compensated.
申请公布号 US2007183017(A1) 申请公布日期 2007.08.09
申请号 US20050562577 申请日期 2005.06.17
申请人 CARL ZEISS SMT AG 发明人 HEMBD CHRISTIAN
分类号 G02F1/03;G02B5/30;G02B13/14;G02B17/08;G02B27/00;G02B27/28;G03F7/20 主分类号 G02F1/03
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