DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS
摘要
The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the exposure radiation. The invention also relates to a process for imaging the undercoating composition.
申请公布号
WO2007054813(A3)
申请公布日期
2007.08.09
申请号
WO2006IB03221
申请日期
2006.11.08
申请人
AZ ELECTRONIC MATERIALS USA CORP.
发明人
TOUKHY, MEDHAT, A.;OBERLANDER, JOSEPH, E.;MULLEN, SALEM, K.