发明名称 Methods and Apparatus for Monitoring Deposition Quality During Conformable Contact Mask Plating Operations
摘要 Electrochemical fabrication (e.g. EFAB) processes and apparatus are disclosed that provide monitoring of at least one electrical parameter (e.g. voltage) during selective deposition where the monitored parameter is used to help determine the quality of the deposition that was made. If the monitored parameter indicates that a problem occurred with the deposition, various remedial operations may be undertaken to allow successful formation of the structure to be completed.
申请公布号 US2007181431(A1) 申请公布日期 2007.08.09
申请号 US20070735393 申请日期 2007.04.13
申请人 UNIVERSITY OF SOUTHERN CALIFORNIA 发明人 ZHANG GANG;COHEN ADAM L.
分类号 C25D5/02;C25D1/00;C25D5/12;C25D21/12;H01L21/288;H01L21/48;H01L21/768;H05K3/24 主分类号 C25D5/02
代理机构 代理人
主权项
地址