发明名称 SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a high-performance electrooptical device, a semiconductor circuit and electronic equipment with these mounted, at a low cost. SOLUTION: A single-crystal silicon thin film, to be obtained utilizing a smart cut method, is formed on a crystallized glass as a highly heat-resistant glass. Here, the entire surface of the crystallized glass is protected by an insulating silicon film to prevent contamination due to a component substance. By so doing, a high-performance semiconductor device can be provided at a low cost. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007201502(A) 申请公布日期 2007.08.09
申请号 JP20070111191 申请日期 2007.04.20
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI
分类号 H01L21/02;H01L27/12;H01L29/786 主分类号 H01L21/02
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