发明名称 METALLIC THIN FILM AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a metallic thin film having a periodic fine structure. SOLUTION: The metallic thin film comprises a metal selected from the group consisting of transition metals with the atomic number of 24 to 48, the oxides thereof and the sulfides thereof, and has a film thickness of 0.01 to 100μm and having holes with a hole diameter of 0.01 to 100μm aligned in a honeycomb way. Further, the production method where a metallic thin film comprising a metal selected from the group consisting of transition metals with the atomic number of 24 to 48, the oxides thereof and the sulfides thereof, having a film thickness of 0.01 to 10μm, and having through holes with a hole diameter of 0.01 to 100μm aligned in a honeycomb way is produced is characterized in that electroless plating is performed with a honeycomb porous body composed of a non-water soluble polymer as a mold. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007197753(A) 申请公布日期 2007.08.09
申请号 JP20060016377 申请日期 2006.01.25
申请人 HOKKAIDO UNIV;FUJIFILM HOLDINGS CORP 发明人 SHIMOMURA MASATSUGU;YABU HIROSHI;YAMAZAKI HIDEKAZU
分类号 C23C18/16;G02B5/18 主分类号 C23C18/16
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