Photomask, pattern formation method using the same and mask data creation method

摘要

A principal pattern made of a plurality of isolated transparent portions is formed in a light-shielding portion disposed on a transparent substrate having a transparent property against exposing light. The principal pattern includes a first principal pattern and a second principal pattern adjacent to each other at a given distance, and a first auxiliary pattern made of a phase shifter portion for transmitting the exposing light in an opposite phase to the exposing light passing through the transparent portion is formed between the first principal pattern and the second principal pattern.