| 摘要 |
A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.
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