MASK FOR APPARATUS MAKING THIN FILM

摘要

A mask for a thin film deposition apparatus is provided to enhance reliability of an electro-luminescence device by forming a shadow mask including SiO2, a polymer compound, and a ceramic-based component to prevent permeation of oxygen and moisture. A chamber(102) includes a substrate having a light emitting unit(103). A thin film forming unit(106) is installed in the chamber. A mask includes a component of SiO2. The component of SiO2 is coated on the mask. The mask is used for depositing a deposition material on the light emitting unit. The deposition material is formed by using the thin film forming unit. The thin film forming unit is installed at a lower end of an inner wall of the chamber. The mask coated with the component of SiO2 is positioned at an upper end of an inner wall of the chamber and is installed at the light emitting unit to face the thin film forming unit.