| 摘要 |
PROBLEM TO BE SOLVED: To quickly and surely harden an application material applied to a defect part of a pattern. SOLUTION: A pattern correction apparatus is provided with: a stage 1 forming aperture parts 10 of a prescribed shape on its upper surface to horizontally hold a TFT liquid crystal substrate 7 on which a pattern is formed; an observing optical system 2 arranged on the upper part of the stage 1 and horizontally and vertically moving in a three-dimensional direction to perform the enlarged observation of a defect part of the pattern of the TFT liquid crystal substrate 7; and heating means 6A, 6B arranged in the aperture parts 10 of the stage 1, raised from stand-by positions and brought into face-contact with the rear face of the TFT liquid crystal substrate 7 to heat and harden a correction material applied to the defect part of the pattern. COPYRIGHT: (C)2007,JPO&INPIT
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