MAGNET STRUCTURE FOR MAGNETRON SPUTTERING APPARATUS, CATHODE ELECTRODE UNIT, MAGNETRON SPUTTERING APPARATUS AND METHOD FOR USING MAGNET STRUCTURE

摘要

A magnet structure (110) for a magnetron sputtering apparatus is provided with first and second stationary magnets (10, 13) arranged on the rear plane side of a target (20) with the same magnetic polarity facing the rear plane of the target. The magnet structure is also provided with magnetic field correcting means (11, 12), which are arranged on the rear plane side of the target (20) between the first and the second stationary magnets (10, 13) and can vary the direction of magnetic moment within a flat plane along the thickness direction and the width direction of the target (20).