DEVICE AND METHOD FOR DESIGNING INTEGRATED CIRCUIT, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To properly design an integrated circuit by more accurately recognizing a correction error of OPC processing.

SOLUTION: A method for designing the integrated circuit is provided in which the integrated circuit is manufactured by using a mask and a reticle manufactured by applying the OPC processing to a pattern regulated by layout pattern data 51. The method includes a step 53 of calculating a pattern after OPC processing obtained by using the mask and reticle manufactured by performing the OPC processing and a step 54 of calculating the OPC correction error by comparing the pattern regulated by the layout pattern data with the pattern subjected to OPC processing.

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