发明名称 Substrate processing apparatus
摘要 Substrate processing with return processing is carried out efficiently by a substrate processing apparatus that continuously processes a plurality of substrates. It is equipped with a conveyor chamber constituting a substrate convey space, a plurality of process chambers in which substrate processing is carried out, substrate convey means provided in the conveyor chamber having a function of conveying substrates, and a substrate convey control means that controls the process of substrate convey by the substrate convey means so that in a case in which after a substrate is continuously processed by two or more process chambers, the substrate is re-conveyed from the last process chamber to any of the two or more process chambers other than the last and return processing implemented, in the re-conveyance the substrate is conveyed to said any of the process chambers after being temporarily retracted to a place other than a process chamber.
申请公布号 US2007184636(A1) 申请公布日期 2007.08.09
申请号 US20050590521 申请日期 2005.05.12
申请人 TAKANO SATOSHI 发明人 TAKANO SATOSHI
分类号 H01L21/322;H01L21/02;H01L21/68 主分类号 H01L21/322
代理机构 代理人
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