发明名称 Semiconductor device having gate-all-around structure and method of fabricating the same
摘要 Semiconductor devices having a gate-all-around (GAA) structure capable of higher operating performance may be provided. A semiconductor device may include a semiconductor substrate, at least one gate electrode, and at least one gate insulating layer. The semiconductor substrate may have a body, at least one supporting post protruding from the body, and at least one pair of fins separated from the body, wherein both ends of each fin of the at least one pair of fins are connected to and supported by the at least one supporting post. The at least one gate electrode may enclose a portion of at least one fin of the at least one pair of fins of the semiconductor substrate, and may be insulated from the semiconductor substrate. The at least one gate insulating layer may be interposed between the at least one gate electrode and the at least one pair of fins of the semiconductor substrate.
申请公布号 US2007181959(A1) 申请公布日期 2007.08.09
申请号 US20070653863 申请日期 2007.01.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK YOON-DONG;KIM SUK-PIL
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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