发明名称 BASIC SOLUTION WASHABLE ANTISTATIC COMPOSITION AND POLYMER PRODUCTS MANUFACTURED BY USING THE SAME
摘要 <p>The present invention provides an antistatic composition which can be used in washing processes using alkaline aqueous solution, that is, can be used to manufacture antistatic polymer products which can resist basic solvents, and antistatic polymer products manufactured by the same. The antistatic composition includes 0.1-20 parts by weight de metal oxides or carbon nanotubes; 0.5-20 parts by weight of a thermosetting resin; 0.02-5 parts by weight of a curing agent; and 55-99.38 by weight of a solvent, in which the antistatic composition is applied on a surface of a base polymer using a solution and can be reused without a change in surface resistance after a washing process using an alkaline aqueous solution,</p>
申请公布号 WO2007089114(A1) 申请公布日期 2007.08.09
申请号 WO2007KR00562 申请日期 2007.02.01
申请人 SUH, KWANG SUCK;KIM, JONG EUN;KIM, TAE YOUNG;KIM, WON JUNG;LEE, TAE HEE 发明人 SUH, KWANG SUCK;KIM, JONG EUN;KIM, TAE YOUNG;KIM, WON JUNG;LEE, TAE HEE
分类号 C09K3/16 主分类号 C09K3/16
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