| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist base material having excellent solubility in a coating solvent, and having characteristics such as high sensitivity, high resolution and high fine processability; and to provide a composition. <P>SOLUTION: The cyclic compound is represented by general formula (1) (wherein, n is an integer of 3 or 4; R is hydrogen or an acid-dissociable dissolution-preventing group; R' is a linear aliphatic hydrocarbon group, a branched aliphatic hydrocarbon group, a phenyl group, a p-phenylphenyl group, a p-tert-butylphenyl group, an aromatic group or a substituent constituted by combining two or more kinds of these substituents). <P>COPYRIGHT: (C)2007,JPO&INPIT |
