| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment liquid supply unit which is capable of increasing the uniformity and stability of a substrate and of decreasing the amount of contamination of the substrate and the amount of the treatment liquid consumed, and to provide a substrate treatment apparatus equipped with the same. SOLUTION: The substrate treatment apparatus is provided with a plurality of upper side chemical discharge heads 15 and lower side chemical discharge heads 17 for supplying a chemical liquid to a substrate 2, wherein each chemical discharge head 15,17 has a cross-sectional rectangular support member 22 and porous membrane 23 fixed to the supporting member 22. The chemical chamber 35 is divided by the supporting member 22 and the porous membrane 23. In the chemical chamber 35, the chemical is supplied through the chemical recovery passage 39 and the chemical supplied to the chemical chamber 35 permeates the porous membrane 23 and forms the liquid membrane 36 between the substrate 2. The substrate 2 to be treated is treated by bringing it into contact with the liquid membrane. COPYRIGHT: (C)2007,JPO&INPIT
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