发明名称 TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 <p>A transistor and its manufacturing method are provided to efficiently control space between a carbon nano tube and a conductor by controlling the width of a spacer. A first dielectric pattern is located on a first conductive structure(102). The first dielectric pattern defines a first hole(11). The first hole exposes the first conductive structure and has a first radius. A second conductive structure pattern(104a) is located on the first dielectric pattern and defines a second hole(12). The second hole is communicated with the first hole and has a second radius greater than the first radius. A second dielectric pattern(103a) is located on the first dielectric pattern and the second conductive structure pattern and communicated with the second hole to define a third hole(13) having the second radius. At least one carbon nano tube(108) is vertically grown from a part of the first conductive structure exposed by the first hole.</p>
申请公布号 KR100749751(B1) 申请公布日期 2007.08.09
申请号 KR20060072907 申请日期 2006.08.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOON, HONG SIK;CHOI, YOUNG MOON;LEE, SUN WOO
分类号 H01L21/336;B82B3/00;H01L29/78 主分类号 H01L21/336
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