| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which can achieve highly accurate exposure by cleaning the upper surface of a substrate and the upper surface (work holder) of a work stage on which the substrate is placed for removing foreign substance. <P>SOLUTION: The exposure device PE is provided with a mask stage 10 to hold a mask M, a first work stage 11 which can move between an exposure position EP and a first waiting position WP1, a second work stage 12 which can move between the exposure position EP and a second waiting position WP2, a foreign substance detection sensor 26 which is arranged at the first and second waiting positions WP1 and WP2 and detects foreign substance on the upper surface of a substrate W, and a cleaning device 29 which is arranged at the first and second waiting positions WP1 and WP2 and remove foreign substance on the upper surface of the substrate W. <P>COPYRIGHT: (C)2007,JPO&INPIT |
