发明名称 GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD
摘要 A gas supply system includes a first and a second branch line branched from a processing gas supply line to be respectively connected with a first and a second gas introduction section for introducing a gas from different portions in a processing chamber and a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first and the second branch line based on pressures in the first and the second processing gas branch line. The gas supply system further includes an additional gas supply unit for supplying an additional gas and an additional gas supply line for allowing the additional gas to flow therein. The first or second gas introduction section is divided into a processing gas introduction section connected with the branch lines and an additional gas introduction section connected with the additional gas supply line.
申请公布号 US2007181181(A1) 申请公布日期 2007.08.09
申请号 US20070668688 申请日期 2007.01.30
申请人 TOKYO ELECTRON LIMITED 发明人 MIZUSAWA KENETSU
分类号 F17D1/00 主分类号 F17D1/00
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