| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for maintaining the treatment performance of a treatment liquid, improving the rate of operation of a substrate-treating device, and reducing the amount of consumption and the amount of waste liquid in the treatment liquid in the substrate-treating device for treating substrates by the treatment liquid. SOLUTION: The substrate-treating device 1 comprises: a cooling mechanism 25 for cooling the treatment liquid in the middle of the circulation path of the treatment liquid; and filters 26, 27 for removing impurities in the treatment liquid. Impurities are thereby deposited as dissolved in the treatment liquid, and the deposited impurities are removed. Hence the treatment performance of the treatment liquid is maintained and the treatment liquid is recycled. Since the frequency for exchanging the treatment liquid with a new one is reduced, the rate of operation of the substrate-treating device is improved and the amount of consumption of the treatment liquid and the amount of waste liquid are reduced. COPYRIGHT: (C)2007,JPO&INPIT
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