| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method in which variation in exposure amount due to dislocation in the mounting position and angle of an exposure head, various aberrations of an optical system and distortion of imaging sections themselves, is eliminated and a wiring pattern, etc., with high definition, small curl and excellent substrate transportability is formed by adding elastomer. <P>SOLUTION: In the pattern forming method, a photosensitive layer contains elastomer and a binder comprising an acid modified vinyl group-containing epoxy resin, and an exposure head has n (n is a natural number of ≥2) two-dimensional imaging sections which reflect light from a light irradiating means, and has a light modulating means capable of controlling the imaging sections according to pattern information. The exposure head is disposed in such a way that a column direction of the imaging sections makes a predetermined set tilt angle θ to a scanning direction. The pattern forming method includes: a step of designating the imaging sections used in N-ply exposure (N is a natural number of ≥2); a step of controlling the imaging sections so that only the designated imaging sections play a roll in the exposure; and a step of exposing the photosensitive layer by relatively moving the exposure head in the scanning direction. <P>COPYRIGHT: (C)2007,JPO&INPIT |
