发明名称 LIGHTING EQUIPMENT AND PROJECTOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a lighting equipment can be manufactured with a structure in which a second lens array with an amount of eccentricity set at high precision. <P>SOLUTION: The lighting equipment 100 is provided with a light source apparatus 110A projecting lighting luminous flux, a first lens array 120A in which a plurality of first small lenses 122A are formed for dividing the lighting luminous flux from the light source apparatus 110A into a plurality of partial luminous fluxes, a second lens array 130A arranged to correspond to a plurality of first small lenses 122A in the first lens array 120A and with each second small lens 132A made eccentric, and a superposing lens 150 for superposing each partial luminous flux from the second lens array 130A in a lighted region. A projecting surface 134A is formed on a surface on which no second small lens 132A is formed among the light incident surface and the light projecting surface of the second lens array 130A. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007200643(A) 申请公布日期 2007.08.09
申请号 JP20060016064 申请日期 2006.01.25
申请人 SEIKO EPSON CORP 发明人 AKIYAMA KOICHI;HASHIZUME TOSHIAKI
分类号 F21S2/00;F21V5/00;F21Y101/00;G03B21/00;G03B21/14 主分类号 F21S2/00
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