| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for preparing a fluorine-based thin film formed on a substrate capable of rapidly and stably forming a fluorine-based thin film of low impurity on the surface of a substrate. SOLUTION: The method for preparing a fluorine-based thin film on a substrate comprises the step (a) of preparing a catalyst solution by causing a mixture of a fluorine-containing silane surfactant having at least one hydrolyzable group, a catalyst capable of interacting with the surfactant, and a fluorine-based solvent capable of dissolving the surfactant, the catalyst, and the reaction product of the surfactant and the catalyst to hydrolyze in the presence of moisture, the step (b) of preparing a solution capable of forming a fluorine-based thin film by admixing and stirring the catalyst solution and a mixture of the surfactant and the solvent, the step (c) of immersing a substrate in the solution capable of forming a fluorinated thin film, and the step (d) of forming a fluorine-based thin film on the surface of the substrate by drying the immersed substrate. COPYRIGHT: (C)2007,JPO&INPIT
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