PLASMA VAPOR DEPOSITION METHOD AND APPARATUS UTILIZING BIPOLAR BIAS CONTROLLER

摘要

An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In some embodiments a bi-polar pulsed DC power supply having input and output terminals and a switching circuit alternately switches a direction of current applied to the substrate holder, to prevent the formation of micro-arcs on the substrate surface.