PELLICLE FOR HIGH NUMERICAL APERTURE EXPOSURE DEVICE

摘要

This invention provides a pellicle that is used in a semiconductor lithography process and is usable in an exposure device having a numerical aperture in an optical system of not less than 1.0. The pellicle comprises a pellicle film having a thickness which has been regulated so that the transmittance as measured in an angle of incidence of exposure light to the pellicle film of not less than 0º and not more than 20º is not less than 95%. The use of the pellicle can realize the manufacture of a semiconductor element having a nonconventional fine circuit pattern at good yield while preventing the adherence of dust onto a leticule.