METHOD OF PROCESSING SUBSTRATE AND CHEMICAL USED IN THE SAME

摘要

A substrate treatment method and a compound used therefor are provided to perform smoothly two-step developing processes on an organic pattern formed on a substrate. Two-step developing processes are performed on an organic film after controlling two-step exposing processes performed on the organic film using different amounts of exposure light, so that a predetermined treatment is performed on an organic pattern with at least two-step film thicknesses. The predetermined treatment is performed by using chemicals in order to shrink partially the organic pattern or to remove partially the organic pattern(S12,S13).