COATING AND DEVELOPING METHOD, COATING AND DEVELOPING APPARATUS AND RECORDING MEDIUM

摘要

A coating and developing method, a coating and developing apparatus and a recording medium are provided to restrain the generation of defects in a developing process and to improve the controllability of CD(Critical Dimension) of a pattern by forming sequentially a protective layer and a liquid layer on a substrate with a resist layer. A resist layer(R) is formed on a substrate(W). A protective layer(D) is formed on the resultant structure in order to protect the resist layer during an exposure process. The protective layer contains a predetermined material with water repellency. A liquid layer(E) is formed on the resist layer. The protective layer is removed from the resultant structure after the exposure process. A heat treatment is performed on the resultant structure. A developing process is then performed thereon.