<p>An exposure system is provided to restrain the decrease of intensity of the excimer layer emitted from a light supply chamber by arranging the light supply chamber and an exposure chamber adjacent to each other. An exposure system(100) includes a light supply chamber and an exposure chamber. The light supply chamber(120) includes a light source for emitting excimer layer. The exposure chamber(110) supplies the excimer layer emitted from the light source onto a substrate along a predetermined pattern of a mask. The light supply chamber is installed in the exposure chamber or adjacent to the exposure chamber. The excimer laser is one selected from a group consisting of KrF excimer layer or ArF excimer laser.</p>
