TRANSFER CHAMBER FOR VACUUM PROCESSING APPARATUS OF SUBSTRATE

摘要

A transfer chamber for a vacuum processing apparatus of a substrate is provided to reduce manufacturing costs and to decrease the total weight by distributing effectively the vacuum pressure applied to an inner portion of the transfer chamber using a protruded lid structure. A transfer chamber(1) includes a lid. The lid(12) is protruded upward. The lid is formed like a round type structure. A cross-section of a sidewall(21) of the transfer chamber is formed like a circle type structure or an oval type structure. The sidewall of the transfer chamber is composed of at least two parts connected with each other. The lid is composed of at least two parts corresponding to the parts of the sidewall of the transfer chamber.