发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE EQUIPMENT AND EXPOSURE METHOD
摘要 <p>A projection optical system is a system with good imaging performance based on well-balanced compensation for aberration associated with image height and aberration associated with numerical aperture, while ensuring a large effective image-side numerical aperture in the presence of a liquid in the optical path between the projection optical system and an image plane. The projection optical system forms an image of a first plane (R) on a second plane (W). An optical path between an optical member (L22:Lb) located nearest to the second plane out of optical members with a refractive power in the projection optical system, and the second plane is filled with a predetermined liquid. The projection optical system satisfies the condition of 0.02 &lt; NA × WD/FA &lt; 0.08, where NA is a numerical aperture on the second plane side of the projection optical system, WD a distance along the optical axis between an optical member located nearest to the first plane in the projection optical system, and the first plane, and FA a maximum of effective diameters of all optical surfaces in the projection optical system.</p>
申请公布号 EP1816502(A1) 申请公布日期 2007.08.08
申请号 EP20050799383 申请日期 2005.10.26
申请人 NIKON CORPORATION 发明人 FUJISHIMA, YOUHEI
分类号 G03F7/20;G02B13/14;G02B13/22;G02B13/24 主分类号 G03F7/20
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