| 摘要 |
A substrate cleaning apparatus and a substrate cleaning method are provided to remove smoothly deionized water from a surface of a substrate and prevent a dry gas from flowing to the predetermined region dried by isopropyl alcohol using enhanced inlet and output holes of a nozzle capable of supplying sufficiently the dry gas in a low speed. A substrate cleaning apparatus includes a spin head(110) for supporting and rotating a substrate, a spraying unit(130) for supplying a drying fluid onto the substrate, and a moving unit(140) for moving a nozzle structure of the spraying unit from a center portion to a peripheral portion. The spraying unit is composed of a first nozzle(134a) for spraying a volatile fluid through a first spraying port and a second nozzle(134b) for spraying a dry gas through a second spraying port. The second spraying port includes an inlet hole and an outlet hole. The cross-section of the outlet hole is larger than that of the inlet hole.
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