| 摘要 |
A substrate 701 on which liquid crystal display panels (702a-d) are formed is provided. A laser beam is aligned through the opening and the silicon layer formed on the substrate is irradiated with the laser beam pattern 703a to cystallize the silicon layer. The substrate is moved in an X direction by scanning distance and the silicon layer is irradiated until the silicon layer is entirely crystallized. A variable mask is used to control the width and length of the laser beam. |
