A method for rinsing a substrate is provided to maximize a rinsing effect by supplying a watersoluble organic solvent of a steam state to a process bath before a QDR process. A process bath is filled with a rinsing solution(S110). A substrate is loaded into the process bath including the rising solution(S120). An opening of the process bath is closed(S130). A watersoluble organic solvent of a steam state is supplied to the process bath(S140). An overflow process is performed by supplying the rinsing solution to the process bath(S150). A draining process is performed to drain the rinsing solution from the process chamber(S160). The overflow process is performed while the steam of the watersoluble organic solvent is supplied to the process bath to lower the surface tension of the rising solution after the substrates are stored in the process bath.
