发明名称 Charge-control pre-scanning for e-beam imaging
摘要 One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary electron beam. A pre-scan is performed over the target area. The electron beam column is re-configured for imaging using the primary electron beam. An imaging scan is then performed over the target area. Other embodiments are also described.
申请公布号 US7253410(B1) 申请公布日期 2007.08.07
申请号 US20050225917 申请日期 2005.09.13
申请人 KLA-TENCOR TECHNOLOGIES CORPORATION 发明人 BERTSCHE KIRK J.;GREENE JOHN
分类号 H01J37/244 主分类号 H01J37/244
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