发明名称 |
Charge-control pre-scanning for e-beam imaging |
摘要 |
One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary electron beam. A pre-scan is performed over the target area. The electron beam column is re-configured for imaging using the primary electron beam. An imaging scan is then performed over the target area. Other embodiments are also described.
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申请公布号 |
US7253410(B1) |
申请公布日期 |
2007.08.07 |
申请号 |
US20050225917 |
申请日期 |
2005.09.13 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
BERTSCHE KIRK J.;GREENE JOHN |
分类号 |
H01J37/244 |
主分类号 |
H01J37/244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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