METHOD AND A SYSTEM FOR SEALING AN EPITAXIAL SILICON LAYER ON A SUBSTRATE,申请号KR20000039068-传众专利搜索

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发明名称	METHOD AND A SYSTEM FOR SEALING AN EPITAXIAL SILICON LAYER ON A SUBSTRATE
摘要
申请公布号	KR100746380(B1)	申请公布日期	2007.08.03
申请号	KR20000039068	申请日期	2000.07.08
申请人		发明人
分类号	H01L21/00;C01B13/10;C30B33/00;H01L21/205;H01L21/677	主分类号	H01L21/00
代理机构		代理人
主权项
地址

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