发明名称 CLEANING APPARATUS FOR PLATE WHICH IS SUPPLYING PROCESSING GAS
摘要 A cleaning apparatus for process gas supply plate is provided to clean effectively a corresponding process gas supply plate by preventing occurrence of foreign materials between a process gas supply plate and a process gas supply plate. A process gas supply plate is installed within a chamber to supply process gas to the inside of the chamber. A plurality of gas holes are formed at one side of the process gas supply plate. One or more jigs(40) are partially coupled with the plate to be exposed one side thereof. A gas hole is formed at the exposed side of the jig. In process for cleaning the process gas supply plate, the jigs are used for protecting the process gas supply plate by preventing a contact between the process gas supply plate and the process gas supply plate. The process gas supply plate is formed with a blocker plate(10) including a first body(12) having a shape of disk and a plurality of first gas holes(14) formed at the first body to supply the large amount of process gas.
申请公布号 KR20070078874(A) 申请公布日期 2007.08.03
申请号 KR20060009261 申请日期 2006.01.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NAM, CHANG HO
分类号 H01L21/304 主分类号 H01L21/304
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