发明名称 ELECTROSTATIC CHUCK DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electrostatic chuck device having even the durability of device itself and having no possibility as a pollution source to a tabular sample such as a semiconductor wafer, because the electrostatic chuck device has the excellent durability and extensibility of a junction layer joining an electrostatic chuck member and a base member for controlling a temperature. SOLUTION: The electrostatic chuck device 1 is composed of the electrostatic chuck member 2 consisting of ceramics, the base member 3 for controlling the temperature consisting of a metal and/or the ceramics, and the junction layer 4 joining and unifying these electrostatic chuck member 2 and base member 3 for controlling the temperature. The junction layer 4 contains a silicone resin composition as a cured body, and a surface-coating aluminum nitride (AlN) particles forming a coating layer consisting of silicon oxide (SiO<SB>2</SB>) on a surface. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194320(A) 申请公布日期 2007.08.02
申请号 JP20060009645 申请日期 2006.01.18
申请人 SUMITOMO OSAKA CEMENT CO LTD 发明人 SATO TAKASHI;MAEDA SHINICHI
分类号 H01L21/683;H02N13/00 主分类号 H01L21/683
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