发明名称 METHOD OF OBSERVING LIGHT SCATTERING
摘要 PROBLEM TO BE SOLVED: To provide a method of observing light scattering capable of reducing a scattering loss at the boundary surface in incidence of a laser beam, simply without requiring a complicated work. SOLUTION: In the method, the side face of a monocrystal wafer 1 applied to a substrate for epitaxial growth is irradiated with the laser beam, and the laser beam emitted from the monocrystal wafer is received by a CCD camera through a microscope, and a scattering image generated from a crystal defect of the monocrystal wafer is observed. The method has characteristics wherein a photo-curing type optical adhesive having a refractive index which is the same as/similar to the refractive index of the monocrystal is applied onto a portion irradiated with the laser beam of the monocrystal wafer, and the adhesive is cured to form a resin coating 2 for preventing the scattering loss at the boundary surface in incidence of a laser beam, and the side face of the monocrystal wafer is irradiated with the laser beam through the resin coating and the scattering image is observed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007192717(A) 申请公布日期 2007.08.02
申请号 JP20060012319 申请日期 2006.01.20
申请人 SUMITOMO METAL MINING CO LTD 发明人 MAEDA KAZUO
分类号 G01N21/956;G01N21/47 主分类号 G01N21/956
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