LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND EXCHANGEABLE OPTICAL ELEMENT

摘要

A lithographic projection apparatus, a device manufacturing method and an exchangeable optical element are provided to improve an imaging capability of the lithographic apparatus. A lithographic projection apparatus includes a projection system(PS) for projecting an image of a pattern onto a substrate(W), and a transport mechanism(MA) moving an exchangeable optical element. The projection system has plural optical elements forming an optical system which projects a beam of radiation along an optical path with a pupil plane. The exchangeable optical element has peripheral dimensions that substantially match relevant parts of a standard for patterning devices. The optical element is moved into and out of the optical path in the pupil plane of the optical system.