发明名称 LIGHT SOURCE DEVICE FOR PERIPHERAL EXPOSURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a light source device for peripheral exposure which is advantageous for the environment, is compact, and offers high efficiency in mass production. <P>SOLUTION: The light source device for peripheral exposure is used to carry out peripheral exposure of wafer in a semiconductor manufacturing process. The light source device includes an LED unit which is disposed close to the peripheral surface of a wafer, and is composed of a plurality of UV-light-emitting diodes having an emission peak wavelength of 240 to 380 nm; and a control means which controls the emission power and turning on and off of respective UV-light-emitting diodes composing the LED unit. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194583(A) 申请公布日期 2007.08.02
申请号 JP20060212992 申请日期 2006.08.04
申请人 ARK TECH KK 发明人 GOSHIMA MIHARU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址