发明名称 Dynamic fluid control system for immersion lithography
摘要 A dynamic fluid control system and method capable of reducing dynamic forces from the fluid on the last optical element ( 20 ) and substrate stage ( 14 ) caused by the motion of the immersion fluid. The system includes an imaging element ( 12 ) that defines an image and a stage ( 14 ) configured to support a substrate ( 16 ). An optical system ( 18 ) is provided to project the image defined by the imaging element onto the substrate. The optical system ( 18 ) includes a last optical element ( 20 ). A gap ( 22 ) filled with immersion fluid is provided between the substrate ( 16 ) and the last optical element ( 20 ). A dynamic force control system ( 34 ) is provided to maintain a substantially constant force on the last optical element and the stage ( 14 ) by compensating for dynamic changes of the immersion fluid caused by the motion of the immersion fluid through the gap and/or movement of the stage.
申请公布号 US2007177118(A1) 申请公布日期 2007.08.02
申请号 US20050628960 申请日期 2005.05.18
申请人 NIKON CORPORATON 发明人 SOGARD MICHAEL
分类号 G03B27/42 主分类号 G03B27/42
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