| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, the positive photosensitive composition being stable to environmental variation and having high sensitivity and high resolution, and to provide a pattern forming method using the same. <P>SOLUTION: The positive photosensitive composition contains (A) a compound having a group (a) of which the hydrophilicity is increased upon irradiation with an actinic ray or radiation and (B) a compound having a group (b) which is decomposed by the action of an alkali to increase solubility in an alkali developer and not having a group which is decomposed by the action of an acid, or contains (AB) a compound having the group (a) of which the hydrophilicity is increased upon irradiation with an actinic ray or radiation and the group (b) which is decomposed by the action of an alkali to increase solubility in an alkali developer and not having a group which is decomposed by the action of an acid. The pattern forming method using the same is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
