发明名称 LITHOGRAPHIC DEVICE, DEVICE MANUFACTURING METHOD AND CONTROL SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide an immersion lithographic device in which cooling is reduced when getting out an immersion liquid. <P>SOLUTION: A capillary channel 20 is formed between a substrate holder WH and an edge structure 15. A plurality of electrodes 21, 22, 23 and 24 are arranged along the capillary channel 20, and the electrodes become lyophilic when it is charged. By using the electrodes, drops of liquid are separated, or the liquid can be pumped along the capillary channel. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194613(A) 申请公布日期 2007.08.02
申请号 JP20060343648 申请日期 2006.12.21
申请人 ASML NETHERLANDS BV 发明人 ANTONIUS LEENDERS MARTINUS HENDRIKUS;LAMBERTUS DONDERS SJOERD NICOLAAS;KEMPER NICOLAAS R
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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