| 摘要 |
<P>PROBLEM TO BE SOLVED: To control the light quantity of exposure light by simple configuration over a wide range with high accuracy. <P>SOLUTION: A substrate is exposed with exposure light passing through a gap between a shutter 34a and a shutter 34b while keeping the gap between the shutter 34a and the shutter 34b in a predetermined width. In a standby state, one of the shutters is completely closed and the other is completely open. First the closed shutter starts to move and moves in an open direction thereof at a predetermined moving velocity, whereby a gap occurs between the two shutters when seen in a traveling direction of exposure light and the exposure light passes through the gap between the two shutters. When the gap between the two shutters attains to a predetermined width W, the open shutter starts to move and moves in a closing direction thereof at the predetermined moving velocity. The gap between the two shutters moves in the moving direction of the two shutters at the same velocity as the moving velocity of the two shutters while being kept in the predetermined width W. <P>COPYRIGHT: (C)2007,JPO&INPIT |
