| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus capable of controlling the polarized state of illumination light to a required state in the case of measuring the optical characteristics of an optical system. <P>SOLUTION: The measuring apparatus for measuring the wave front aberration of a projecting optical system PL is provided with an illuminating optical system 12 for illuminating the projecting optical system PL by illumination light from a light source, a polarization control unit 2 and a diffusion plate 38 for setting the polarized state of illumination light on the pupil surface of the projecting optical system PL, a collimate lens 23 and a micro fly-eye 24 for converting light through the projecting optical system PL into light having light quantity distribution corresponding to phase information on the pupil surface, and an image forming element for detecting the converted light. <P>COPYRIGHT: (C)2007,JPO&INPIT |
