| 摘要 |
PROBLEM TO BE SOLVED: To improve resistance characteristics of a gas barrier layer against an etching liquid and a cleaning liquid in a process after a gas barrier layer film forming in an organic EL element composed of sequentially laminating a color filter layer, the gas barrier layer, and an organic EL structure on a substrate. SOLUTION: In the organic EL element 100 composed of sequentially laminating the color filter layer 13, the gas barrier layer 20, and the organic EL structure 30 on the substrate 11, the gas barrier layer 20 is an amorphous thin film composed of AlxTiyOz which is a metal oxide of Al and Ti, and the ratio of the number of atoms of Ti to Al in a composition ratio of this AlxTiyOz is 10 atom% or more. COPYRIGHT: (C)2007,JPO&INPIT
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