发明名称 |
Mask fabrication supporting method, mask blank providing method, and mask blank dealing system |
摘要 |
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
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申请公布号 |
US2007178387(A1) |
申请公布日期 |
2007.08.02 |
申请号 |
US20050592320 |
申请日期 |
2005.03.07 |
申请人 |
HOYA CORPORATION |
发明人 |
ISHIDA HIROYUKI;AIYAMA TAMIYA;MARUYAMA KOICHI |
分类号 |
B32B9/00;B32B17/06;B32B17/10;G03F1/00;G03F1/08;G03F9/00;H01L21/027 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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