发明名称 Device for uniform coating of substrate surface with liquid has moistening device for applying liquid in process volume to substrate surface, tumbling device for tilting holder, substrate relative to two axes in plane parallel to surface
摘要 <p>The device has a holder for the substrate (10) for fixing the substrate so that a process volume is formed by the surface of the substrate and the holder, a moistening device for applying the liquid in the process volume to the surface of the substrate and a tumbling device for tilting the holder with the substrate relative to first and second axes, whereby the first and second axes are arranged in a plane parallel to the surface of the substrate and form a predefined angle with respect to each other to distribute the liquid on the substrate surface. An independent claim is also included for a method of uniform coating of substrate surfaces.</p>
申请公布号 DE102006007446(B3) 申请公布日期 2007.08.02
申请号 DE20061007446 申请日期 2006.02.17
申请人 STANGL SEMICONDUCTOR EQUIPMENT AG 发明人 STANGL, WOLFGANG;STANGL, HANS-JUERGEN
分类号 B05C11/08;G03F7/16;H01L21/00;H01L31/18 主分类号 B05C11/08
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