发明名称 |
Apparatus for Treating Plasma and Method for Cleaning the Same |
摘要 |
An apparatus for treating plasma includes an inner chamber, an outer chamber receiving the inner chamber and including a gas supplier that supplies a gas into the inner chamber, an inner electrode disposed in the inner chamber, and a plasma generator supplying power independently to the inner electrode and the inner chamber.
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申请公布号 |
US2007175495(A1) |
申请公布日期 |
2007.08.02 |
申请号 |
US20070668805 |
申请日期 |
2007.01.30 |
申请人 |
KIM WEON-HONG;WON SEOK-JUN;KWON DAE-JIN;SONG MIN-WOO;KIM JU-YOUN;PARK JUNG-MIN |
发明人 |
KIM WEON-HONG;WON SEOK-JUN;KWON DAE-JIN;SONG MIN-WOO;KIM JU-YOUN;PARK JUNG-MIN |
分类号 |
B08B6/00;C23C16/00;C23F1/00 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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