发明名称 Apparatus for Treating Plasma and Method for Cleaning the Same
摘要 An apparatus for treating plasma includes an inner chamber, an outer chamber receiving the inner chamber and including a gas supplier that supplies a gas into the inner chamber, an inner electrode disposed in the inner chamber, and a plasma generator supplying power independently to the inner electrode and the inner chamber.
申请公布号 US2007175495(A1) 申请公布日期 2007.08.02
申请号 US20070668805 申请日期 2007.01.30
申请人 KIM WEON-HONG;WON SEOK-JUN;KWON DAE-JIN;SONG MIN-WOO;KIM JU-YOUN;PARK JUNG-MIN 发明人 KIM WEON-HONG;WON SEOK-JUN;KWON DAE-JIN;SONG MIN-WOO;KIM JU-YOUN;PARK JUNG-MIN
分类号 B08B6/00;C23C16/00;C23F1/00 主分类号 B08B6/00
代理机构 代理人
主权项
地址