发明名称 Field conditions for ion excitation in linear ion processing apparatus
摘要 Methods for applying an RF field in a two-dimensional electrode structure include applying RF voltages to main electrodes and to compensation electrodes. The voltages on the compensation electrodes may be proportional to the voltages on the main electrodes so as to optimize the RF field for processes involving ion excitation, including collision-induced dissociation. Electrode structures may include main trapping electrodes, one or more compensation electrodes, one or more ion exit apertures, and a device or circuitry for applying the various desired voltages.
申请公布号 US2007176094(A1) 申请公布日期 2007.08.02
申请号 US20060342473 申请日期 2006.01.30
申请人 VARIAN, INC. 发明人 WELLS GREGORY J.
分类号 H01J49/42 主分类号 H01J49/42
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